Ultra-Low Loss Coating

  It is applied for the purpose of minimizing the loss in the process of coating the optical functional thin film on the optical substrate, It includes the purity of the materials that make up the thin film using super-polished substrates, the density of the thin film, the optimization of physic/chemical/environment characteristics, and the optimization of the thin film process. In particular, in order to achieve ultra-low loss characteristics, cleaning, etching, and heat treatment processes, including the thin film process itself, are key. Finally, the finished ultra-low loss coating product is measured with the ppm level accuracy for scattering loss, absorption loss and penetration loss. Also, particles and Scratch/Dig are also observed under a high magnification microscope. The ultra-low loss coating-based optics are applied as laser components in the ultraviolet band, laser ultra-precision measurement and a key component technology in the field of inertial navigation systems.

 Scatter loss : 5ppm (at 633nm)

 Absorption loss : 10ppm (at 633nm)

 Reflectivity : 99.998% (for S-Pol, AOI 45º, at 633nm)

 Particle/Scratch/Dig free

 Outstanding environmental stability

 Thin film Materials : Ta2O5, SiO2, HfO2

 Substrate Materials : Fused Silica, Zerodur, BK-7

  Laser-induced damage threshold (LIDT) for the wide wavelength range from 300nm to 3,000nm, including Nd: YAG laser wavelength of 1064nm, is improved to enable higher laser power. To improve the laser damage threshold, thin film properties, deposition parameters and contamination management are important. In particular, to improve the durability of thin films, advanced thin film deposition methods are applied instead of general E-beam coating methods. LIDT enhancement technology is applied in a variety of applications, in addition to general optical substrates, for laser crystals and nonlinear crystals. In addition, the spectrum control performance and the light transmittance / reflection are also improved, and especially the improved performance technology in the "UV" band.

 Working wavelength : 300 ~ 2,000nm

 LIDT : Pulse 79J/cm^2 (@1064nm, 10ns pulse width, 10Hz repeatability) 

         CW 164kw/cm (@1070nm)

 High uniformity and run-to-run repeatability

 Outstanding environmental stability

 High precision AR/HR/Filter performance

 Thin film Materials : Ta2O5, SiO2, HfO2, ZrO2

 Substrate Materials : Fused Silica, Zerodur, BK-7, Crystals